It is a seriousness for FPD, Semi-Conductor and HDD Manufacturers to face the Quality and Reliability problem caused by Airborne Metal Particles in the Clean Room.
The Particle Counter is generally used for the measurement of the Qty., and Size Distribution of Particles. ICP-MS is useful for analysis of Metal Element, but needs the pre-treatment to make an Aerosol sample. Therefore, it is difficult to analyze the Metal Element of Particle as the Real time On-line Monitoring.
The Air-based Metal Particles sample can be converted to the Ar(Argon99.99%)-based sample with employing the GAS Converter, which is introduced into the ICP-MS directly without time-wasted pre-treatment.
The GAS Converter combined with ICP-MS is fully recommended to analyze the Airborne Metal Particles for finding the Emission source as the real time Monitoring Apparatus in Clean Room of manufacturing Process. We believe that it becomes easier to find one/some of causes for production yield problem.
yMetal Contaminationz
There is a lot of potential of Metal/Ion contamination in the Clean Room as shown below;
| Contamination | Metal/Ion | Emission Source |
| Ion | Na{ , Li{ , K{ | Liquid, Solid and Low Materials |
| Heavy Metal | Fe, Ni, Cr | Stainless Material, Robot, Chamber, Wafer handling M/C |
| Noble Metal | Au, Pt, Ag, Cu | Materials, Chamber |
| Others | Al, Ca, Mg | Chamber, Handling Materials, Clean Room, Human Body |
The GAS Converter is consisted of two concentric Glass tubes, where inner tube is made of porous glass tube.
Air Sample Gas contained Particles is introduced into the inner tube , and, the excess amount of Sweep Gas (Ar)
is supplied to the outer tube. Then Gas molecules (N2,O2,CO2, and H2O) in the Air sample are exchanged to Sweep Gas molecule(Ar),
while Metal Particles in the Air sample remains in the inner tube due to slower diffusion speed.
| Items | Current Method | Newly Recommended Method |
| System | Impinger+ICP-MS | Gas Exchange Device(GED){ICP-MS |
| Sampling Method | Filter trapped and Liquid Adsorption; Sampling efficiency is quite low. | Continually adsorption of Gas sample(200mL/min.) |
| Analyzing Time | 1`5days per a data | 10ms per a dataAcontinues monitoring |
| Ion interference | ArO ÌFe | Low interference level |
Sigma-f, Co.,Ltd.
Room#406 11-12, Yushima 1-choume, Bunkyo-ku, Tokyo 113-0034 Japan
TEL:+81-3-5805-7767 FAX:0+81-3-5800-0877
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